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RunwayML ( is an artificial intelligence (AI) creative platform that aims to help artists, designers, creative professionals, and researchers leverage machine learning (ML) technologies to create and innovate. The platform provides an easy-to-use interface that enables users to train, test, and deploy various ML models for creating a wide range of digital art and creative works.

RunwayML supports multiple ML techniques and algorithms such as GANs, VAEs, LSTMs, CNNs, etc. Users can leverage pre-trained models and algorithms, as well as train and create with their own data. The platform also offers a plethora of tutorials and examples to help users quickly learn the basic principles and application techniques of machine learning.

With RunwayML, users can easily create and manipulate various types of media files such as images, videos, audios, text, etc. and imbue them with higher artistic value and creativity. The platform is also widely recognized and used by many prominent artists and creative teams in the fields of digital art, virtual reality, animation production, architectural design, fashion design, and more.

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